Metastability in undoped microcrystalline silicon thin films deposited by HWCVD

S. K. Persheyev, K. A. O'Neill, S. Anthony, M. J. Rose, V. Smirnov, S. Reynolds

    Research output: Chapter in Book/Report/Conference proceedingChapter (peer-reviewed)

    5 Citations (Scopus)
    Original languageEnglish
    Title of host publicationAmorphous and nanocrystalline silicon science and technology--2004
    Subtitle of host publicationsymposium held April 13-16, 2004, San Francisco, California, U.S.A.
    EditorsGautam Ganguly
    Place of PublicationWarrendale, Pa
    PublisherMaterials Research Society
    Pages41-46
    Number of pages6
    Volume808
    ISBN (Print)155899758X
    Publication statusPublished - 2004
    EventSymposium A: Amorphous and Nanocrystalline Silicon Science and Technology - San Francisco, United States
    Duration: 12 Apr 200416 Apr 2004
    http://www.mrs.org/s04-program-a/

    Conference

    ConferenceSymposium A: Amorphous and Nanocrystalline Silicon Science and Technology
    CountryUnited States
    CitySan Francisco
    Period12/04/0416/04/04
    Internet address

    Cite this

    Persheyev, S. K., O'Neill, K. A., Anthony, S., Rose, M. J., Smirnov, V., & Reynolds, S. (2004). Metastability in undoped microcrystalline silicon thin films deposited by HWCVD. In G. Ganguly (Ed.), Amorphous and nanocrystalline silicon science and technology--2004: symposium held April 13-16, 2004, San Francisco, California, U.S.A. (Vol. 808, pp. 41-46). Warrendale, Pa: Materials Research Society.
    Persheyev, S. K. ; O'Neill, K. A. ; Anthony, S. ; Rose, M. J. ; Smirnov, V. ; Reynolds, S. / Metastability in undoped microcrystalline silicon thin films deposited by HWCVD. Amorphous and nanocrystalline silicon science and technology--2004: symposium held April 13-16, 2004, San Francisco, California, U.S.A.. editor / Gautam Ganguly. Vol. 808 Warrendale, Pa : Materials Research Society, 2004. pp. 41-46
    @inbook{900c02a499dc4f54a99203dddf12fd43,
    title = "Metastability in undoped microcrystalline silicon thin films deposited by HWCVD",
    author = "Persheyev, {S. K.} and O'Neill, {K. A.} and S. Anthony and Rose, {M. J.} and V. Smirnov and S. Reynolds",
    year = "2004",
    language = "English",
    isbn = "155899758X",
    volume = "808",
    pages = "41--46",
    editor = "Gautam Ganguly",
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    publisher = "Materials Research Society",

    }

    Persheyev, SK, O'Neill, KA, Anthony, S, Rose, MJ, Smirnov, V & Reynolds, S 2004, Metastability in undoped microcrystalline silicon thin films deposited by HWCVD. in G Ganguly (ed.), Amorphous and nanocrystalline silicon science and technology--2004: symposium held April 13-16, 2004, San Francisco, California, U.S.A.. vol. 808, Materials Research Society, Warrendale, Pa, pp. 41-46, Symposium A: Amorphous and Nanocrystalline Silicon Science and Technology, San Francisco, United States, 12/04/04.

    Metastability in undoped microcrystalline silicon thin films deposited by HWCVD. / Persheyev, S. K.; O'Neill, K. A.; Anthony, S.; Rose, M. J.; Smirnov, V.; Reynolds, S.

    Amorphous and nanocrystalline silicon science and technology--2004: symposium held April 13-16, 2004, San Francisco, California, U.S.A.. ed. / Gautam Ganguly. Vol. 808 Warrendale, Pa : Materials Research Society, 2004. p. 41-46.

    Research output: Chapter in Book/Report/Conference proceedingChapter (peer-reviewed)

    TY - CHAP

    T1 - Metastability in undoped microcrystalline silicon thin films deposited by HWCVD

    AU - Persheyev, S. K.

    AU - O'Neill, K. A.

    AU - Anthony, S.

    AU - Rose, M. J.

    AU - Smirnov, V.

    AU - Reynolds, S.

    PY - 2004

    Y1 - 2004

    M3 - Chapter (peer-reviewed)

    SN - 155899758X

    VL - 808

    SP - 41

    EP - 46

    BT - Amorphous and nanocrystalline silicon science and technology--2004

    A2 - Ganguly, Gautam

    PB - Materials Research Society

    CY - Warrendale, Pa

    ER -

    Persheyev SK, O'Neill KA, Anthony S, Rose MJ, Smirnov V, Reynolds S. Metastability in undoped microcrystalline silicon thin films deposited by HWCVD. In Ganguly G, editor, Amorphous and nanocrystalline silicon science and technology--2004: symposium held April 13-16, 2004, San Francisco, California, U.S.A.. Vol. 808. Warrendale, Pa: Materials Research Society. 2004. p. 41-46