Practical application of OPC in electrical circuits

M. McCallum, A. Tsiamis, S. Smith, J. T. M. Stevenson, A. J. Walton, A.C. Hourd

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Citation (Scopus)

    Abstract

    Today's Optical Proximity Correction (OPC) is becoming increasingly complex and necessitates using smaller and smaller grid sizes to produce the fine patterns required. These small grids lead to very high overhead in data handling, as well as for the tools that will write and inspect the mask; which together make masks extremely expensive. For two dimensional structures such as corners, we use complex structures incorporating either additive or subtractive OPC features to produce the desired shape. It is unclear though, how precisely the final structures must match the original design to perform their intended electrical functions. In this work we have created a number of corner type electrical test structures and applied different degrees of OPC to both the outer and inner corners of the structures. These features were then printed on doped polysilicon wafers, and the wafers were etched and electrically tested. The electrical effect of OPC on the outer corner was found to be minimal, whereas the inner corner shape had a significant effect upon the electrical resistance of the circuit feature. The data suggests that OPC on the outside corner has little impact upon a simple circuit's performance, but care should be taken with OPC on the inner corners, particularly with regard to the size of the OPC serifs used.
    Original languageEnglish
    Title of host publicationPhotomask Technology 2009
    EditorsLarry S. Zurbrick, M. Warren Montgomery
    Place of PublicationBellingham
    PublisherSPIE-International Society for Optical Engineering
    ISBN (Print)9780819477958
    DOIs
    Publication statusPublished - 2009
    EventSPIE Photomask Technology 2009 - Monterey Marriott and Monterey Conference Center, Monterey, United States
    Duration: 14 Sep 200917 Sep 2009
    http://spie.org/x37334.xml

    Publication series

    NameProceedings of SPIE
    PublisherSPIE
    Volume7488

    Conference

    ConferenceSPIE Photomask Technology 2009
    CountryUnited States
    CityMonterey
    Period14/09/0917/09/09
    Internet address

    Fingerprint

    Masks
    Acoustic impedance
    Data handling
    Networks (circuits)
    Polysilicon

    Cite this

    McCallum, M., Tsiamis, A., Smith, S., Stevenson, J. T. M., Walton, A. J., & Hourd, A. C. (2009). Practical application of OPC in electrical circuits. In L. S. Zurbrick, & M. W. Montgomery (Eds.), Photomask Technology 2009 [74883B ] (Proceedings of SPIE; Vol. 7488). Bellingham: SPIE-International Society for Optical Engineering. https://doi.org/10.1117/12.830053
    McCallum, M. ; Tsiamis, A. ; Smith, S. ; Stevenson, J. T. M. ; Walton, A. J. ; Hourd, A.C. / Practical application of OPC in electrical circuits. Photomask Technology 2009. editor / Larry S. Zurbrick ; M. Warren Montgomery. Bellingham : SPIE-International Society for Optical Engineering, 2009. (Proceedings of SPIE).
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    McCallum, M, Tsiamis, A, Smith, S, Stevenson, JTM, Walton, AJ & Hourd, AC 2009, Practical application of OPC in electrical circuits. in LS Zurbrick & MW Montgomery (eds), Photomask Technology 2009., 74883B , Proceedings of SPIE, vol. 7488, SPIE-International Society for Optical Engineering, Bellingham, SPIE Photomask Technology 2009, Monterey, United States, 14/09/09. https://doi.org/10.1117/12.830053

    Practical application of OPC in electrical circuits. / McCallum, M.; Tsiamis, A.; Smith, S.; Stevenson, J. T. M.; Walton, A. J.; Hourd, A.C.

    Photomask Technology 2009. ed. / Larry S. Zurbrick; M. Warren Montgomery. Bellingham : SPIE-International Society for Optical Engineering, 2009. 74883B (Proceedings of SPIE; Vol. 7488).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

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    McCallum M, Tsiamis A, Smith S, Stevenson JTM, Walton AJ, Hourd AC. Practical application of OPC in electrical circuits. In Zurbrick LS, Montgomery MW, editors, Photomask Technology 2009. Bellingham: SPIE-International Society for Optical Engineering. 2009. 74883B . (Proceedings of SPIE). https://doi.org/10.1117/12.830053